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The prediction of behavior of microelectronics manufacturing processes with a high degree of uncertainty and variability of conditions requires the use of flexible and adaptive approaches. Studying predictive models that account for stochastic factors affecting the efficiency and quality of microelectronics manufacturing processes is a critical task. In this work, the issues of enhancing adequacy of a predictive model capable to account for stochastic factors in microe-lectronics manufacturing processes are considered. Predictive models obtained on the basis of stochastic differential systems make it possible to account for many parameters, their nonlineari-ties and mutual influence. It is proposed to use linear stochastic differential systems for simulat-ing photolithography processes, and bilinear stochastic differential systems for etching processes. A predictive model based on the Lurie equations has been developed to assess the production process stability. The issues of predicting the behavior of dynamic systems of random structure, the examples of which are modern ICs and systems on a chip, were considered. The need to inte-grate stochastic approaches into the simulation of microelectronics production processes is demonstrated: this would allow significant increase in efficiency of production management un-der uncertainty and in the quality of manufactured products.
Larisa G. Gagarina
National Research University of Electronic Technology (Russia, 124498, Moscow, Zelenograd, Shokin sq., 1)
Yulia S. Shevnina
vnina1*, M. Yu. Semenov2, S. F. Tsarapkin1, E. I. Minakov3 1National Research University of Electronic Technology (Russia, 124498, Moscow, Zelenograd, Shokin sq., 1)
Mikhail Yu. Semenov
NM-Tech LLC, (Russia, 124527, Moscow, Zelenograd, Solnechnaya prwy, 6)
Sergey F. Tsarapkin
National Research University of Electronic Technology (Russia, 124498, Moscow, Zelenograd, Shokin sq., 1)
Evgeniy I. Minakov
Tula State University, (Russia, 300012, Tula, Lenin Ave., 92)

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